Hot Sale Mono 12V 10bb 9bb 182mm Solar Cell for Solar

• Customization: Available
• After-sales Service: Product Warranty& Output Power Warrantynty
• Warranty: 25 Years
• Model NO.: 182MM*182MM
• Application: Solar Panels
• Condition: New
• Certification: ISO, CE
• Material: Monocrystalline Silicon
• Size: 182*182*0.5mm
• Busbar: 10bb
• Power: 7.23-7.46W
• Type: Perc, Half Cell, Bifacial, Mono-Crystalline
• Panel Efficiency: 21.9-22.6%
• Cell Thickness: 175*175*0.5mm
• Interval: 17.3mm
• Transport Package: 1200PCS/Carton
• Trademark: Flagsun
• Origin: China
• HS Code: 8541402000
• Production Capacity: 300MW/Year
• Package Size: 18.20cm * 18.20cm * 0.15cm
• Package Gross Weight: 0.100kg

Product Description

Product Description

 

Silicon type	size	Front electrode pattern
Mono-crystalline	182*182±0.5Φ247mm	ten busbar
		interval :17.3mm

 

Parameter items			Specification	Tolerance	Unit
Front surface	A	Finger quantity	140	-	-
	B	Front busbar width	1	±0.1	mm
	C	Distance between busbars	17.3	±0.15	mm
Rare surface	a	Back busbar width	1.6	±0.3	mm
	b	Distance between back busbars	17.3	±0.15	mm
	c	Back finger quantity	160	-	-

 

Eff (%)	Efficiency(%)	Pmpp(W)	Impp(A)	Umpp(V)	Isc(A)	Uoc(V)
22.6	22.6-22.7	7.46	12.604	0.592	13.226	0.688
22.5	22.5-22.6	7.43	12.57	0.591	13.187	0.687
22.4	22.4-22.5	7.4	12.535	0.59	13.147	0.686
22.3	22.3-22.4	7.36	12.5	0.589	13.108	0.685
22.2	22.2-22.3	7.33	12.465	0.588	13.068	0.684
22.1	22.1-22.2	7.3	12.43	0.587	13.028	0.683
22	22.0-22.1	7.26	12.395	0.586	12.988	0.682
21	21.9-22.0	7.23	12.36	0.585	12.948	0.681

 

Electrical properties
Voc:-0.3 %/ºC	Intensity:1000 W/m²
Isc: +0.06 %/ºC	Spectrum:AM1.5G

Production process

Cleaning & Texturing: Wafers are cleaned with industrial soaps and form square-based pyramids also called texture. The texturization helps to reduce the reflection of sunlight. 

Diffusion: Wafers that have been pre-droped with boron during the casting process are then given a negative(n-type) surface characteristic by diffusing them with a phosphorus source at high temperature, which in turn creats the negative/positive(n-p) junction.

Etching: Phosphorus diffuses not only into the desired wafer surface but also into the side and the opposite surface to form PN. This gives a shunt path between the cell front and rear. Removal of the path around the wafer edge/edge junction isolation is named etching.

PECVD: By PECVD equipment, the wafers are coated with anti-reflection coating(ARC). It's the blue silicion nitride film to reduce reflection and promote absorption of light.

Printing & Heating: it was adopted by printing paste with screen technology to print the electrodes of silicion solar, and form a good ohmic contact.
Testing & Sorting: It means classifying the cells according to their efficiency tested under the simulated sunlight.


 

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